Ham-Let introduces ultra-fast diaphragm valve for ALD applications
Ham-Let, a global manufacturer of instrumentation valves and fittings for industrial and high purity fluid and gas delivery systems recently launched its ultra-fast (UF series) diaphragm valve for atomic layer deposition.
'Our UF series unique flow adjustment mechanism, patent pending no. US 61/910, 79, allows for precise flow adjustment and stable flow capacity during rapid high cycle operation,' says Felix Shestatski, VP of quality, engineering and R&D at Ham-Let.
The optional extended bonnet and cooling fin provide a solution when precise and repeatable performance in high-temperature applications is required. The UF series offers sealing performance and durability in hazardous environments, under severe demands of ultra-fast actuation at ultra-high purity (UHP) applications.
The UF series meets the demand for high precision diaphragm valves that can perform repeatable and reproducible performance over an extremely frequent and large number of cycles, required by ALD applications.
In addition, the series offers a range of applicable accessories, such as: position indicators, direct mounted solenoid valves (for actuation speed optimisation), integrated thermocouples, and heaters.
Ham-Let developed a special high temperature fully immersed version of UF valve for 120°C, enabling position indication and with special inductive sensor designator. The UF series is available in surface mount (IGS) and in-line type of connections, two-way and multiport configurations.