New Swagelok ALD7 UHP Valve
Swagelok has announced the release of the ALD7 ultrahigh-purity (UHP) diaphragm valve.
Compared to Swagelok’s current top-of-the-line ALD6 valve, the ALD7 provides better flow consistency, flow capacity and actuator speed.
It also offers the performance at high temperatures necessary to allow chip fabricators to overcome limitations in current production processes and keep up with demand.
ALD7 valves can be integrated into either new tools or legacy equipment to provide improved flow capacity (up to 0.7 Cv) in the same 1.5-inch (38.1mm) footprint as existing valves, helping fabricators keep up with the strong global demand for chips that power advanced technology.
ALD7 valves deliver precise dosing over tens of millions of ALD (atomic layer deposition) production cycles by actuating more quickly and consistently than even its ALD6 predecessor.
The actuator’s open and close response time can be less than 5ms. The actuator is immersible to 150°C (302°F) and the valve body is rated to 200°C (392°F), allowing the valve to better support low-vapor-pressure precursors that require high temperature delivery.
“Since developing the industry’s first fit for purpose ALD valve nearly 20 years ago, we have worked with semiconductor customers to better understand the levels of performance needed from our UHP valves as chip manufacturers continue shrinking process nodes and maximising chip yields,” said Ben Olechnowicz, product manager at Swagelok.
“This has resulted in pursuing innovative thinking and developing valves to actuate faster, perform in more extreme conditions, and allow higher coefficients of flow in demanding atomic layer processes."
Compared to Swagelok’s current top-of-the-line ALD6 valve, the ALD7 provides better flow consistency, flow capacity and actuator speed.
It also offers the performance at high temperatures necessary to allow chip fabricators to overcome limitations in current production processes and keep up with demand.
ALD7 valves can be integrated into either new tools or legacy equipment to provide improved flow capacity (up to 0.7 Cv) in the same 1.5-inch (38.1mm) footprint as existing valves, helping fabricators keep up with the strong global demand for chips that power advanced technology.
ALD7 valves deliver precise dosing over tens of millions of ALD (atomic layer deposition) production cycles by actuating more quickly and consistently than even its ALD6 predecessor.
The actuator’s open and close response time can be less than 5ms. The actuator is immersible to 150°C (302°F) and the valve body is rated to 200°C (392°F), allowing the valve to better support low-vapor-pressure precursors that require high temperature delivery.
“Since developing the industry’s first fit for purpose ALD valve nearly 20 years ago, we have worked with semiconductor customers to better understand the levels of performance needed from our UHP valves as chip manufacturers continue shrinking process nodes and maximising chip yields,” said Ben Olechnowicz, product manager at Swagelok.
“This has resulted in pursuing innovative thinking and developing valves to actuate faster, perform in more extreme conditions, and allow higher coefficients of flow in demanding atomic layer processes."
